The second EOS Conference on Manufacturing of Optical Components 2011 (EOSMOC 2011) will highlight significant future market trends, emerging technologies and associated prospective developments. It is held under the umbrella of the WORLD OF PHOTONICS CONGRESS 2011 (22 - 26 May 2011).

 

Synopsis 

The continuing growth of the optics sector is closely bound to advancements and innovative manufacturing developments. The importance of sophisticated but economically priced optical components has never before had such a wide reaching impact on new products and processes and applications. In order to produce many of these ‘next generation’ optical components, new and innovative fabrication processes and test methods are crucial.

The second EOS Conference on Manufacturing of Optical Components 2011 (EOSMOC 2011) will highlight significant future market trends, emerging technologies and associated prospective developments. This meeting provides a forum to discuss all aspects of optics fabrication and testing ranging from micro-optics to large optics, and from high-value one-of-a-kind optics to mass-produced optics.

The conference will bring together commercial developments and ongoing research. It will be a unique opportunity for exchanging information with renowned researchers, scientists, engineers and professionals from all over Europe!

Manufacturing of Optical Components 2011 is held under the umbrella of the WORLD OF PHOTONICS CONGRESS 2011, Munich (DE), the leading international congress for optical technologies in Europe. [www.world-of-photonics.net]

Overview of EOSMOC 2009

• more than 70 contributions
• more than 100 attendees
   

This first conference in 2009 showed the need for a Europe-based conference on Optics Manufacturing especially in the industrial context of the LASER World of PHOTONICS 2011 and the scientific context of the WORLD of PHOTONICS CONGRESS.

 

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General Chairs

• Klaus-Friedrich Beckstette, Carl Zeiss AG, Jena/Oberkochen, DE
• Co-Chair: Paul Comley, Cranfield University, UK

 

Programme Committee

• Olivier Acher, HORIBA Jobin Yvon, FR
• Lutz Aschke, LIMO Lissotschenko Mikrooptik GmbH, DE
• Stefan Bäumer, Philips Applied Technologies, NL
• Keith Carlisle, Lawrence Livermore National Laboratory - LLNL, US
• Pierre Chavel, CNRS / Institut d'Optique, FR
• Olaf Dambon, Fraunhofer Institute for Production Technology IPT, DE
• Ramona Eberhardt, Fraunhofer Institute for Applied Optics and Precision Engineering IOF, DE
  
• Oliver Fähnle, FISBA OPTIK AG, CH
• Andreas Fischer, JENOPTIK Polymer Systems GmbH, DE
• Martin Forrer, FISBA OPTIK AG, CH
• Roland Geyl, SAGEM SA, FR
• Peter Lehmann, Universität Kassel, DE
• Peter MacKay, Gooch and Housego (UK) Ltd, UK
• Wolfgang Osten, Universität Stuttgart, DE
• Olivier Parriaux, Université St. Etienne, FR
• David Price, Qioptiq Ltd., UK
• Markus Rossi, Heptagon, CH
• Axel Schindler, Leibniz-Institut f. Oberflächenmodifizierung e.V., DE
• Klaus Schindler, OptoNet e.V., DE
• Emmanuel Sein, Astrium EADS, FR
• Paul Shore, Cranfield University, UK
• Guus Taminiau, Photonics Cluster Netherlands, NL
• Wilhelm Ulrich, Carl Zeiss AG, DE
• Reinhard Völkel, SUSS MicroOptics SA, CH
• David Walker, University College London, Glyndwr University and Zeeko Ltd., UK

 

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Sub-Conferences

I) Theoretical and Practical Aspects of Manufacturing and Finishing Technologies

• Abrasive processes: grinding, smoothing, jet polishing, abrasive jet, MRF
• Single point cutting: diamond turning, fly cutting, milling, ultrasound assisted machining, laser processing, vibration assisted polishing
• Energy beam processes: ion beam figuring and polishing, laser and plasma processes
• Aspheric optics, free-form optics
• μ- and n-optics
• Lasers as manufacturing tools
• Glass molding, polymer molding
• Finishing processes using slurries (incl. charact. of slurries, chemistry ...)

 Chairs

• Olaf Dambon, Fraunhofer Institute for Production Technology IPT, DE
• Axel Schindler, Leibniz-Institut f. Oberflächenmodifizierung e.V., DE

Invited Speaker

• Kazuto Yamauchi, Osaka University, JP

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II) Optics Manufacturing Processes

• Manufacturing processes: from µ to large optics
• Cost-efficient optical components manufacturing
• Ultra-stable optical mounting processes
• Large scale optics (roll to roll processes etc.)
• Integrating references and feedback loops in design, manufacturing, and metrology
• Fabrication & testing developments that expand the design horizon
• Wafer level optics

 Chair

• Martin Forrer, FISBA OPTIK AG, CH

Invited Speaker

• Ramona Eberhardt, Fraunhofer Institute for Applied Optics and Precision Engineering IOF, DE
  

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III) Optical Manufacturing for Emerging Products and Processes

• Energy programs: concentrated solar thermal, concentrated photo-voltaic, fusion
• Display technologies: 3D, flexible displays, animated packaging, animated wall coverings
• Light management: automotive developments, intelligent diffusers
• Innovative materials for existing and emerging applications
• New design ideas requiring new optical components

Chairs

• Stefan Bäumer, Philips Applied Technologies, NL
• Wilhelm Ulrich, Carl Zeiss AG, DE 
  

 Invited Speaker

• Juan Carlos Miñano, Universidad Politécnica de Madrid, ES

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IV) Testing for Fabrication and Assembly

• Asphere and Freeform measurements
• Calibration and absolute testsInnovative ideas in profilometry for optical elements
• Advanced interferometric systems and techniques
• Testing of extreme dimension optics and diffractive optics
• In-process/in-machine measurement for improved optics production

 Chairs

• Peter Lehmann, Universität Kassel, DE
• Guus Taminiau, Photonics Cluster Netherlands, NL

Invited Speaker

• Gunther Notni, Fraunhofer Institute for Applied Optics and Precision Engineering IOF, DE

 

This sub-conference will be a joint session  with the SPIE Conference  "Optical Metrology".

 

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V) Special Session: European Support Instruments for Optical Components Manufacturers

At the special session “European Support Instruments for Optical Components” information will be given on FP 7 (7th Framework Programme for Research and Technology Development of the European Commission) funded projects relevant to the manufacturing of optical components and on other opportunities that allow for fostering technological progress through these projects.
 

Chairs

• Pierre Chavel, CNRS / Institut d'Optique, FR
• Olivier Parriaux, Université St. Etienne, FR

Invited Speakers

• Ronan Burgess, Photonics Unit, DG INFSO - European Commission, BE
• Jürgen Mohr, Karlsruher Institute of Technology (KIT), Institute of Micro Structure Technology, DE
• Hugo Thienpont, Department of Applied Physics and Photonics, Vrije Universiteit Brussels, BE

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Paper Publication in JEOS:RP

Attendees of this EOSOF 2011 receive a 20% discount on the publication rate for the Journal of the European Optical Society - Rapid Publications (JEOS:RP). The paper submitted must be an original contribution that is connected to this conference and must be submitted no later than 29 July 2011.

JEOS:RP is a peer-reviewed open-access journal which is listed with ISI Journal Citation Reports [www.jeos.org].

Special publication rates for the attendees of EOSMOC 2011:

• 320 € (instead of 400 €) for non-members
• 280 € (instead of 350 €) for full-members

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Venue, Travel and Accomodation

Venue

ICM - International Congress Centre Munich
Am Messesee

81829 Munich
Germany

 

 

 

The ICM is one of the most modern congress centers in the world. It is integrated into the New Munich Trade Fair Centre, located in Munich.

 

Travel

Due to Munich’s excellent infrastructure, the ICM can easily be reached with the public transport.

Underground U2 goes directly to the ICM ("Messestadt West" station) and runs from 5:30 to 24:00.

For more information, please go to the World of Photonics website: Getting there

  

 

 

 

Accomodation

• A list of hotels alongside the underground U2 and near the ICM can be downloaded here: EOS hotel list
• MunichMesse München is providing a hotel guide at www.world-of-photonics.net/en/photonics-congress/travel-accomodation/your-stay/accommodation.
• "Check-in Roomservice" for private rooms in all price categories: www.checkin-muenchen.de/index.php
• Well-prized student accommodations can be found  at www.hostelworld.com/hostels/

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Registration

At least one author of an accepted contribution is requested to register properly in advance to the conference. Speakers at “EOSMOC 2011” have to register with EOS. The registration for the EOS conference on Manufacturing of Optical Components includes admission to all conferences of the WORLD OF PHOTONICS CONGRESS 2011 as well as to the LASER World of PHOTONICS 2011 exhibition. Registration opens on 18 February 2011.

Registration options:

• Register via our secure online shop: www.old.myeos.org/shop
• Register via fax, using the following fax form: fax registration.

 

Fees

Category	Early-bird 18/02 -  29/04/2011	Late/on-site from 30/04/2011
Full member	490 €	570 €
Non-member	610 €	690 €
Student member	105 €	150 €
Student non-member	145 €	185 €
One day	210 €	270 €

 

Special Tickets for Exhibitors

Each exhibitor participating in LASER World of PHOTONICS 2011 receives one free ticket* to the World of Photonics Congress. Beyond that, each exhibitor may purchase up to five tickets* to the World of Photonics Congress at a special rate. Please note: Both free and special rate tickets are not valid for speakers at World of Photonics Congress 2011.

*May only be ordered and used by exhibiting companies. They are personalized and are only valid for the ticketholder. They are not transferrable. Congress proceedings are not included.

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Contact

Renate Rebmann (M.A.)
European Optical Society (EOS)
Communications and Event Manager

Hollerithallee 8
30419 Hannover
Germany

Phone: +49-511-2788-159
Fax: +49-511-2788-119

E-mail: munich@myeos.org
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